Fundamental Principles of Optical Lithography
The Science of Microfabrication
(Sprache: Englisch)
Fundamental Principles of Optical Lithography: The Science of Microfabrication presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. This sole authored text includes optional computer...
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Fundamental Principles of Optical Lithography: The Science of Microfabrication presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. This sole authored text includes optional computer simulation exercises as well as problems at the end of each chapter.
Klappentext zu „Fundamental Principles of Optical Lithography “
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components.By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate.
This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter.
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components.
By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, i.e., the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate.
This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter.
By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, i.e., the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate.
This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter.
Inhaltsverzeichnis zu „Fundamental Principles of Optical Lithography “
Preface1. Introduction to Semiconductor Lithography
1.1 Basics of IC Fabrication
1.2 Moore's Law and the Semiconductor Industry
1.3 Lithography Processing
Problems
2. Aerial Image Formation - The Basics
2.1 Mathematical Description of Light
2.2 Basic Imaging Theory
2.3 Partial Coherence
2.4 Some Imaging Examples
Problems
3. Aerial Image Formation - The Details
3.1 Aberrations
3.2 Pupil Filters and Lens Apodization
3.3 Flare
3.4 Defocus
3.5 Imaging with Scanners Versus Steppers
3.6 Vector Nature of Light
3.7 Immersion Lithography
3.8 Image Quality
Problems
4. Imaging in Resist: Standing Waves and Swing Curves
4.1 Standing Waves
4.2 Swing Curves
4.3 Bottom Antirefl ection Coatings
4.4 Top Antirefl ection Coatings
4.5 Contrast Enhancement Layer
4.6 Impact of the Phase of the Substrate Refl ectance
4.7 Imaging in Resist
4.8 Defi ning Intensity
Problems
5. Conventional Resists: Exposure and Bake Chemistry
5.1 Exposure
5.2 Post-Apply Bake
5.3 Post-exposure Bake Diffusion
5.4 Detailed Bake Temperature Behavior
5.5 Measuring the ABC Parameters
Problems
6. Chemically Amplifi ed Resists: Exposure and Bake Chemistry
6.1 Exposure Reaction
6.2 Chemical Amplifi cation
6.3 Measuring Chemically Amplifi ed Resist Parameters
6.4 Stochastic Modeling of Resist Chemistry
Problems
7. Photoresist Development
7.1 Kinetics of Development
7.2 The Development Contrast
7.3 The Development Path
7.4 Measuring Development Rates
Problems
8. Lithographic Control in Semiconductor Manufacturing
8.1 Defi ning Lithographic Quality
8.2 Critical Dimension Control
8.3 How to Characterize Critical Dimension Variations
8.4 Overlay Control
8.5 The Process Window
8.6 H-V Bias
8.7 Mask Error Enhancement Factor (MEEF)
8.8 Line-End Shortening
8.9 Critical Shape and Edge Placement Errors
8.10 Pattern Collapse
Problems
9.
... mehr
Gradient-Based Lithographic Optimization: Using the Normalized Image Log-Slope
9.1 Lithography as Information Transfer
9.2 Aerial Image
9.3 Image in Resist
9.4 Exposure
9.5 Post-exposure Bake
9.6 Develop
9.7 Resist Profi le Formation
9.8 Line Edge Roughness
9.9 Summary
Problems
10. Resolution Enhancement Technologies
10.1 Resolution
10.2 Optical Proximity Correction (OPC)
10.3 Off-Axis Illumination (OAI)
10.4 Phase-Shifting Masks (PSM)
10.5 Natural Resolutions
Problems
Appendix A. Glossary of Microlithographic Terms
Appendix B. Curl, Divergence, Gradient, Laplacian
Appendix C. The Dirac Delta Function
Index
9.1 Lithography as Information Transfer
9.2 Aerial Image
9.3 Image in Resist
9.4 Exposure
9.5 Post-exposure Bake
9.6 Develop
9.7 Resist Profi le Formation
9.8 Line Edge Roughness
9.9 Summary
Problems
10. Resolution Enhancement Technologies
10.1 Resolution
10.2 Optical Proximity Correction (OPC)
10.3 Off-Axis Illumination (OAI)
10.4 Phase-Shifting Masks (PSM)
10.5 Natural Resolutions
Problems
Appendix A. Glossary of Microlithographic Terms
Appendix B. Curl, Divergence, Gradient, Laplacian
Appendix C. The Dirac Delta Function
Index
... weniger
Autoren-Porträt von Chris Mack
Dr. Chris A. Mack developed the lithography simulation software PROLITH, and founded and ran the company FINLE Technologies fro ten years. He then served as Vice President of Lithography Technology for KLA Tencor for five years, until 2005. In 2003 he received the SEMI Award for North America for his efforts in lithography simulation and education. He is also an adjunct faculty member at the University of Texas at Austin. Currently, he writes, teaches, and consults on the field of semiconductor microlithography in Austin, Texas.
Bibliographische Angaben
- Autor: Chris Mack
- 2007, 1. Auflage, 568 Seiten, Maße: 25,2 cm, Gebunden, Englisch
- Verlag: Wiley & Sons
- ISBN-10: 0470018933
- ISBN-13: 9780470018934
Sprache:
Englisch
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