Rapid Thermal Processing of Semiconductors
(Sprache: Englisch)
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field,...
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Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
Inhaltsverzeichnis zu „Rapid Thermal Processing of Semiconductors “
Transient Heating of Semiconductors by Radiation. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals. Crystallization, Impurity Diffusion and Segregation in Polycrystalline Silicon. Component Evaporation, Defect Annealing and Impurity Diffusion in the III-V Semicondutors. Diffusion Synthesis of Silicides in Thin Film Metal-Silicon Structures. Rapid Thermal Oxidation and Nitridation. Rapid Thermal Chemical Vapor Deposition. Indexes.
Bibliographische Angaben
- Autoren: Peter J. Hesketh , Victor E. Borisenko
- 1997, 376 Seiten, Maße: 18,3 x 26 cm, Gebunden, Englisch
- Verlag: Springer US
- ISBN-10: 0306450542
- ISBN-13: 9780306450549
- Erscheinungsdatum: 31.05.1997
Sprache:
Englisch
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