Thin Films and Heterostructures for Oxide Electronics

Ferroelectrics, Nano-scale phenomena, High k Dielectrics.- Nanoscale Phenomena in Ferroelectric Thin Films.- High-K Candidates for Use as the Gate Dielectric in Silicon Mosfets.- Science and Technology of High-Dielectric Constant (K) Thin Films for Next Generation CMOS.- Magnetic Memory and Spintronics.- Materials Requirements for Magnetic Random-Access Memory (MRAM) Devices.- Manganite, Magnetite, and Double- Perovskite Thin Films and Heterostructures.- Interfaces and Surfaces: Correlated Electron Systems.- Interfaces in Materials with Correlated Electron Systems.- Electronic Reconstruction at Surfaces and Interfaces of Correlated Electron Materials.- Wide Band Gap Semiconductors.- Wide Band Gap ZnO and ZnMgO Heterostructures for Future Optoelectronic Devices.- Combinatorial Synthesis and Materials Discovery.- Combinatorial Synthesis of Functional Metal Oxide Thin Films.- Diluted Magnetic Oxide Systems.- Film Growth and Real-Time in situ Characterization.- Real-Time Growth Monitoring by High-Pressure Rheed During Pulsed Laser Deposition.- Recent Advances in the Deposition of Multi-Component Oxide Films by Pulsed Energy Deposition.- Epitaxial Growth and Properties of Magnetically Doped TiO2.

Professor Satischandra Ogale is a senior scientist at the National Chemistry Laboratory in Pune (India) and a Professor of Physical Sciences at the ACSIR in New Delhi. After obtaining his academic degrees from the University of Poona, he spent 9 years as senior researcher at the University of Maryland (USA). Dr. Ogale has authored more than 330 research publications and one book.