Directed Self-assembly of Block Co-polymers for Nano-manufacturing (ePub)
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The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology.
Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques.
- Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic
- Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing
- Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields
- 2015, 328 Seiten, Englisch
- Herausgegeben: Roel Gronheid, Paul Nealey
- Verlag: Elsevier Science & Techn.
- ISBN-10: 0081002610
- ISBN-13: 9780081002612
- Erscheinungsdatum: 17.07.2015
Abhängig von Bildschirmgröße und eingestellter Schriftgröße kann die Seitenzahl auf Ihrem Lesegerät variieren.
- Dateiformat: ePub
- Größe: 15 MB
- Mit Kopierschutz
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