Spectroscopy of Complex Oxide Interfaces / Springer Series in Materials Science Bd.266 (PDF)

Claudia Cancellieri has the following Professional Experience and Education: (2014-present) She is a Research Scientist at the Laboratory for Joining Technologies and Corrosion, EMPA, Dübendorf, Switzerland. Her research interests include Surface analysis and growth of oxides on metals and study of metallic nanomultilayers. (2011-2014) She completed her Post-Doctoral Fellowship in Surface X-Ray Diffraction Station, Materials Science Beamline at the Swiss Light Source (SLS), Paul Scherrer Institut (PSI), Villigen, Switzerland, under the title "Study of the structure and electronic properties of complex-oxide interfaces grown by laser ablation for transistors and electronic devices applications". (2008-2011) She completed her Post-Doctoral Fellowship in the Department of Condensed Matter Physics, University of Geneva, Switzerland, which includes Research on complex oxide interfaces, field-effect devices, Study of the growth by laser ablation and electronic characterization of complex oxides, and Study of the interface properties: magnetotransport, x-ray diffraction, superconductivity, and topography. (2004-2008) She received her PhD in Physics, Ecole Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland, Thesis title: "Photoemission and electronic properties of thin (strained) cuprate films by laser ablation heteroepitaxy". Her areas of interest include Research on thin films of superconducting materials, Construction and optimization of a new Pulsed Laser Deposition (PLD) system for thin-film growth linked to a photoemission chamber for in-situ Angle-Resolved Photoemission Spectroscopy (ARPES) electronic analysis and Study of structural, electronic and superconducting properties of La2-xSr2CuO4 thin films under epitaxial strain. (2003-2004) She did her Diploma thesis work (Master of Science) at the ENEA Frascati Research Center in Frascati, Rome, Italy, Title: "Deposition and characterization of Ca-doped YBa2Cu3O7 - epitaxial thin films". The work focused