Glow-Discharge Hydrogenated Amorphous Silicon
(Sprache: Englisch)
A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
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A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
Bibliographische Angaben
- Autor: K. Tanaka
- 1990, 292 Seiten, Maße: 16 x 24,1 cm, Gebunden, Englisch
- Verlag: Springer Netherlands
- ISBN-10: 0792303091
- ISBN-13: 9780792303091
- Erscheinungsdatum: 30.11.1989
Sprache:
Englisch
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