Ion Implantation Technology: 17th International Conference on Ion Implantation Technology
(Sprache: Englisch)
The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment...
Leider schon ausverkauft
versandkostenfrei
Buch (Gebunden)
245.40 €
122 DeutschlandCard Punkte
sammeln
- Lastschrift, Kreditkarte, Paypal, Rechnung
- Kostenlose Rücksendung
- Ratenzahlung möglich
Produktdetails
Produktinformationen zu „Ion Implantation Technology: 17th International Conference on Ion Implantation Technology “
Klappentext zu „Ion Implantation Technology: 17th International Conference on Ion Implantation Technology “
The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).
Bibliographische Angaben
- 2008, 556 Seiten, Maße: 22,2 x 28,2 cm, Gebunden, Englisch
- Herausgegeben: Edmund G. Seebauer, Yevgeniy V. Kondratenko, Susan B. Felch
- Verlag: AIP-Press
- ISBN-10: 0735405972
- ISBN-13: 9780735405974
Sprache:
Englisch
Kommentar zu "Ion Implantation Technology: 17th International Conference on Ion Implantation Technology"
0 Gebrauchte Artikel zu „Ion Implantation Technology: 17th International Conference on Ion Implantation Technology“
| Zustand | Preis | Porto | Zahlung | Verkäufer | Rating |
|---|
Schreiben Sie einen Kommentar zu "Ion Implantation Technology: 17th International Conference on Ion Implantation Technology".
Kommentar verfassen