X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures
(Sprache: Englisch)
This monograph represents a critical survey of the outstanding capabilities of X-ray
diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some...
diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some...
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Produktinformationen zu „X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures “
This monograph represents a critical survey of the outstanding capabilities of X-ray
diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers. It is of particular relevance at semiconductor layer systems where, for example, interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesoscopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine aspects of self-organized growth of mesoscopic structures with corresponding X-ray diffuse scattering experiments.
diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers. It is of particular relevance at semiconductor layer systems where, for example, interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesoscopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine aspects of self-organized growth of mesoscopic structures with corresponding X-ray diffuse scattering experiments.
Klappentext zu „X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures “
This monograph represents a critical survey of the outstanding capabilities of X-ray
diffuse scattering for the structural characterization of mesoscopic material systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers. It is of particular relevance at semiconductor layer systems where, for example, interface roughness or low-dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesoscopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine aspects of self-organized growth of mesoscopic structures with corresponding X-ray diffuse scattering experiments.
Inhaltsverzeichnis zu „X-Ray Diffuse Scattering from Self-Organized Mesoscopic Semiconductor Structures “
A Brief Introduction to the Topic.- Basic Principles of X-Ray Diffuse Scattering on Mesoscopic Structures.- Experimental Optimization.- A Model System: LPE SiGe/Si(001) Islands.- Dynamical Scattering at Grazing Incidence.- Characterization of Quantum Dots.- Characterization of Interface Roughness.- Appendix.
Bibliographische Angaben
- Autor: Martin Schmidbauer
- 2004, 2004, 204 Seiten, Maße: 16 x 24,1 cm, Gebunden, Englisch
- Verlag: Springer
- ISBN-10: 3540201793
- ISBN-13: 9783540201793
- Erscheinungsdatum: 09.01.2004
Sprache:
Englisch
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