Chemistry in Microelectronics (ePub)

Microelectronics is a complex world where many sciences need to
collaborate to create nano-objects: we need expertise in
electronics, microelectronics, physics, optics and mechanics also
crossing into chemistry, electrochemistry, as well as biology,
biochemistry and medicine. Chemistry is involved in many fields
from materials, chemicals, gases, liquids or salts, the basics of
reactions and equilibrium, to the optimized cleaning of surfaces
and selective etching of specific layers. In addition, over recent
decades, the size of the transistors has been drastically reduced
while the functionality of circuits has increased. This book
consists of five chapters covering the chemicals and sequences used
in processing, from cleaning to etching, the role and impact of
their purity, along with the materials used in "Front End Of
the Line" which corresponds to the heart and performance of
individual transistors, then moving on to the "Back End Of
the Line" which is related to the interconnection of all the
transistors. Finally, the need for specific functionalization also
requires key knowledge on surface treatments and chemical
management to allow new applications.

Contents

1. Chemistry in the "Front End of the Line" (FEOL):
Deposits, Gate Stacks, Epitaxy and Contacts, François Martin,
Jean-Michel Hartmann, Véronique Carron and Yannick Le
Tiec.

2. Chemistry in Interconnects, Vincent Jousseaume, Paul-Henri
Haumesser, Carole Pernel, Jeffery Butterbaugh, Sylvain
Maîtrejean and Didier Louis.

3. The Chemistry of Wet Surface Preparation: Cleaning, Etching and
Drying, Yannick Le Tiec and Martin Knotter.

4. The Use and Management of Chemical Fluids in Microelectronics,
Christiane Gottschalk, Kevin Mclaughlin, Julie Cren, Catherine
Peyne and Patrick Valenti.

5. Surface Functionalization for Micro- and Nanosystems:
Application to Biosensors, Antoine Hoang, Gilles Marchand,
Guillaume Nonglaton, Isabelle Texier-Nogues and Francoise
Vinet.

About the Authors

Yannick Le Tiec is a technical expert at CEA-Leti, Minatec since
2002. He is a CEA-Leti assignee at IBM, Albany (NY) to develop the
advanced 14 nm CMOS node and the FDSOI technology. He held
different technical positions from the advanced 300 mm SOI CMOS
pilot line to different assignments within SOITEC for advanced
wafer development and later within INES to optimize solar cell
ramp-up and yield. He has been part of the ITRS Front End technical
working group at ITRS since 2008.