Ferroelectric Dielectrics Integrated on Silicon (PDF)
(Sprache: Englisch)
This book describes up-to-date technology applied to high-K
materials for More Than Moore applications, i.e. microsystems
applied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-K
dielectrics thin...
materials for More Than Moore applications, i.e. microsystems
applied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-K
dielectrics thin...
sofort als Download lieferbar
eBook (pdf)
192.99 €
- Lastschrift, Kreditkarte, Paypal, Rechnung
- Kostenloser tolino webreader
Produktdetails
Produktinformationen zu „Ferroelectric Dielectrics Integrated on Silicon (PDF)“
This book describes up-to-date technology applied to high-K
materials for More Than Moore applications, i.e. microsystems
applied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-K
dielectrics thin films including extrinsic effects, this book
emphasizes the specificity of thin films. Deposition and patterning
technologies are then presented. A whole chapter is dedicated to
the major role played in the field by X-Ray Diffraction
characterization, and other characterization techniques are also
described such as Radio frequency characterization. An in-depth
study of the influence of leakage currents is performed together
with reliability discussion. Three applicative chapters cover
integrated capacitors, variables capacitors and ferroelectric
memories. The final chapter deals with a reasonably new research
field, multiferroic thin films.
materials for More Than Moore applications, i.e. microsystems
applied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-K
dielectrics thin films including extrinsic effects, this book
emphasizes the specificity of thin films. Deposition and patterning
technologies are then presented. A whole chapter is dedicated to
the major role played in the field by X-Ray Diffraction
characterization, and other characterization techniques are also
described such as Radio frequency characterization. An in-depth
study of the influence of leakage currents is performed together
with reliability discussion. Three applicative chapters cover
integrated capacitors, variables capacitors and ferroelectric
memories. The final chapter deals with a reasonably new research
field, multiferroic thin films.
Autoren-Porträt
Emmanuel Defaÿ has been involved at CEA LETI Minatec in piezoelectric and High-K dielectrics for 15 years. He has published 70 scientific papers, one book on piezoelectrics and worked with several top level microelectronics manufacturers (IBM, Freescale, ST). He is currently a lecturer at Ecole Centrale Paris and By-Fellow of Churchill College, Cambridge University, UK.
Bibliographische Angaben
- 2013, 1. Auflage, 448 Seiten, Englisch
- Herausgegeben: Emmanuel Defaÿ
- Verlag: John Wiley & Sons
- ISBN-10: 1118602765
- ISBN-13: 9781118602768
- Erscheinungsdatum: 07.02.2013
Abhängig von Bildschirmgröße und eingestellter Schriftgröße kann die Seitenzahl auf Ihrem Lesegerät variieren.
eBook Informationen
- Dateiformat: PDF
- Größe: 11 MB
- Mit Kopierschutz
Sprache:
Englisch
Kopierschutz
Dieses eBook können Sie uneingeschränkt auf allen Geräten der tolino Familie lesen. Zum Lesen auf sonstigen eReadern und am PC benötigen Sie eine Adobe ID.
Kommentar zu "Ferroelectric Dielectrics Integrated on Silicon"
0 Gebrauchte Artikel zu „Ferroelectric Dielectrics Integrated on Silicon“
| Zustand | Preis | Porto | Zahlung | Verkäufer | Rating |
|---|
Schreiben Sie einen Kommentar zu "Ferroelectric Dielectrics Integrated on Silicon".
Kommentar verfassen