Handbook of Thin Film Deposition (ePub)
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Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability.
- Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes
- Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries
- Features a new chapter discussing Gates Dielectrics
Currently a principal member of the technical staff and serves on the patent evaluation board at GlobalFoundries Corporation in East Fishkill, NY, working on process development for 14nm CMOS. A graduate from Rensselaer Polytechnic Institute, he joined IBM Microelectronics in 1981 and has worked on a variety of research and development projects including: reactive ion etching, epitaxial film growth, process integration and thin film processing. During his tenure there, he published 25 technical journal papers and has over 100 US patents issued.
- 2018, 4. Auflage, 470 Seiten, Englisch
- Herausgegeben: Krishna Seshan, Dominic Schepis
- Verlag: Elsevier Science & Techn.
- ISBN-10: 0128123125
- ISBN-13: 9780128123126
- Erscheinungsdatum: 23.02.2018
Abhängig von Bildschirmgröße und eingestellter Schriftgröße kann die Seitenzahl auf Ihrem Lesegerät variieren.
- Dateiformat: ePub
- Größe: 17 MB
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