MOS Interface Physics, Process and Characterization (PDF)

Name: MOS Interface Physics, Process and Characterization
Brand: Taylor & Francis
SKU: 139667086
Price: 61.49 EUR
Availability: OnlineOnly

(Sprache: Englisch)

Autoren: Shengkai Wang , Xiaolei Wang

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MOS Interface Physics, Process and Characterization, Shengkai Wang, Xiaolei Wang

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The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental examples focusing on MOS and will...

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Autoren-Porträt von Shengkai Wang, Xiaolei Wang

Shengkai Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the University of Tokyo in 2011 and has been engaged in Ge, III-V, SiC in MOS technology. He has published more than 100 papers and authorized 40+ patents.

Xiaolei Wang is a professor in the Institute of Microelectronics, Chinese Academy of Sciences. He received Ph.D. from the Institute of Microelectronics, Chinese Academy of Sciences in 2013 and has been engaged in Si/Ge based MOS technology. He has published more than 100 papers.