Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

Preface. List of Participants. List of Contributors.Electroplating and Electroless Deposition Processes for Electronic Components and Microsystems; T.E.G. Daenen, D.L. de Kubber.Self-Assembled Electroactive Ultrathin Films; T.P. Cassagneau.Feature and Mechanisms of Layer Growth in Liquid Phase Epitaxy of Semiconductor Materials; M. Konuma.Sol-Gel Deposition Processes of Thin Ceramic Films; D. Sporn, et al.Thin Film Deposition by Sol-Gel and CVD Processing of Metal-Organic Precursors; S. Mathur.Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes; C.R. Kleijn.Chemical Vapor Deposition of Superconductor and Oxide Films; G. Wahl, et al.Selective Chemical Vapor Deposition; J. Holleman.Photochemical Vapour Deposition of Thin Films; S.J.C. Irvine.Reaction Mechanisms in Laser-Assisted Chemical Vapor Deposition of Microstructures; Y. Pauleau, D. Tonneau.Proximal Probe Induced Chemical Processing for Nanodevice Elaboration; D. Tonneau, et al.Molecular Dynamics Simulation of Thin Film Growth with Energetic Atoms; C.M. Gilmore, J.A. Sprague.Deposition of Thin Films by Sputtering; W. Gulbinski.Mass-Transport in an Austenitic Stainless Steel under High-Flux, Low-Energy Nitrogen Ion Bombardment at Elevated Temperature; L. Pranevicius, et al.Index.