Lecture Notes on Principles of Plasma Processing
(Sprache: Englisch)
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a...
Leider schon ausverkauft
versandkostenfrei
Buch (Kartoniert)
149.79 €
Produktdetails
Produktinformationen zu „Lecture Notes on Principles of Plasma Processing “
Klappentext zu „Lecture Notes on Principles of Plasma Processing “
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes.This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. The included CD contains a copy of the book which can be indexed using a Search function, and which can be enlarged on a monitor for a closer look at the diagrams. Sample homework and exam problems can also be found on the CD.
This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Inhaltsverzeichnis zu „Lecture Notes on Principles of Plasma Processing “
- Preface- Part A1: Introduction to Plasma Science
- Part A2: Introduction to Gas Discharges
- Part A3: Plasma Sources I
- Part A4: Plasma Sources II
- Part A5: Plasma Sources III
- Part A6: Plasma Sources IV
- Part A7: Plasma Diagnostics
- Part B1: Overview of Plasma Processing in Microelectronics Fabrication
- Part B2: Kinetic Theory and Collisions
- Part B3: Atomic Collisions and Spectra
- Part B4: Molecular Collisions and Spectra
- Part B5: Plasma Diagnostics
- Part B6: Plasma Surface Kinetics
- Part B7: Feature Evolution and Modeling
- Epilogue: Current Problems in Semiconductor Processing
Bibliographische Angaben
- Autoren: Francis F. Chen , Jane P. Chang
- 2003, XI, 208 Seiten, Maße: 21,1 x 28,1 cm, Kartoniert (TB), Englisch
- Verlag: Springer Netherlands
- ISBN-10: 0306474972
- ISBN-13: 9780306474972
Sprache:
Englisch
Kommentar zu "Lecture Notes on Principles of Plasma Processing"
0 Gebrauchte Artikel zu „Lecture Notes on Principles of Plasma Processing“
Zustand | Preis | Porto | Zahlung | Verkäufer | Rating |
---|
Schreiben Sie einen Kommentar zu "Lecture Notes on Principles of Plasma Processing".
Kommentar verfassen