Nanolithography

Preface. Electron Beam Lithography. Nanolithography, the Integrated System; F.J. Hohn. Electron Beam Resists and Pattern Transfer Methods; M. Hatzakis. Nanolithography developed through Electron-Beam-Induced Surface Reaction; S. Matsui, Y. Ochiai, M. Baba, H. Watanabe. Direct Writing of Nanoscale Patterns in SiO2; X. Pan, A.N. Broers. Sub-10 nm Electron Beam Lithography: -AIF-Doped Lithium Fluoride as a Resist; W. Langheinrich, H. Beneking. Surface Imaging for EB-Nanolithography; M. Böttcher, L. Bauch, A. Wolff, W. Höppner. Patterning of InGaAs/GaAs Quantum Dots Using E-Beam Lithography and Selective Removal of the Top Barrier; A. Schmidt, F. Faller, A. Forchel. Fabrication of Ultrasmall InGaAs/InP Nanostructures by High Voltage Electron Beam Lithography and Wet Chemical Etching; P. Ils, M. Michel, A. Forchel, I. Gyuro, P. Speier, E. Zielinski. Fabrication, Investigation and Manipulation of Artificial Nanostructures; A. Menschig, F.E. Prins, G. Lehr, R. Bergmann, J. Hommel, U.A. Griesinger, V. Härle, F. Scholz, H. Schweizer. Nano-Lithography in 3 Dimensions with Electron Beam Induced Deposition; H.W.P. Koops, M. Rudolph, J. Kretz, M. Weber. Nanolithography Requirements -- an Equipment Manufacturer's View; B.A. Wallman, G. Crawley. X-Ray Lithography. X-Ray Nanolithography: Limits, and Applications to Sub-100 nm Manufacturing; H.I. Smith, M.L. Schattenburg. X-Ray Phase Shifting Masks; F. Cerrina, J. Xiao, Z.Y. Guo. Fabrication of X-Ray Mask for Nanolithography by EBL; M. Gentili. Ion Beam Lithography. Intense Focused Ion Beams for Nanostructurisation; S. Kalbitzer, Ch. Wilbertz, Th. Miller. Latest Results Obtained with the Alpha IonProjection Machine; W. Fallmann, A. Bruckner, E. Cekan, W. Friza, F. Paschke, G. Stangl, F. Thalinger, H. Löschner, G. Stengl, P. Hudek. STM Lithography. Direct Writing with a Combined STM/SEM System; A.L. de Lozanne, W.F. Smith, E.E. Ehrichs. Low Voltage e-Beam Lithography with the Scanning Tunneling Microscope; C.R.K.