Vacuum Technology in the Chemical Industry

FUNDAMENTALS OF VACUUM TECHNOLOGY
Introduction
Fundamentals of Vacuum Technology
 
CONDENSATION UNDER VACUUM
What Is Condensation?
Condensation under Vacuum without Inert
Condensation with Inert Gases
Saturated Inert Gas - Vapour Mixtures
Vapour - Liquid Equilibrium
Types of Condensers
Heat Transfer and Condensation Temperature in a Surface Condenser
Vacuum Control in Condensers
Installation of Condensers
Special Condenser Types
 
LIQUID RING VACUUM PUMPS IN INDUSTRIAL PROCESS APPLICATIONS
Design and Functional Principle of Liquid Ring Vacuum Pumps
Operating Behaviour and Design of Liquid Ring Vacuum Pumps
Vibration and Noise Emission with Liquid Ring Vacuum Pumps
Selection of Suitable Liquid Ring Vacuum Pumps
Process Connection and Plant Construction
Main Damage Symptoms
Table of Symbols
 
STEAM JET VACUUM PUMPS
Design and Function of a Jet Pump
Operating Behaviour and Characteristic
Cntrol of Jet Compresors
Multi-Stage Steam Jet Vacuum Pumps
Comparison of Steam, Air and Other Motive Media
 
MECHANICAL VACUUM PUMPS
Introduction
The Different Types of Mechanical Vacuum Pumps
When Using Various Vacuum Pump Designs in the Chemical or Pharmaceutical Process Industry, the Following Must Be Observed
 
BASICS OF THE EXPLOSION PROTECTION AND SAFETY-TECHNICAL REQUIREMENTS ON VACUUM PUMPS FOR MANUFACTURERS AND OPERATING COMPANIES
Introduction
Explosion Protection
Directive 99/92/EC
Directive 94/9/EC
Summary
 
MEASUREMENT METHODS FOR GROSS AND FINE VACUUM
Pressure Units and Vacuum Ranges
Directly and Indirectly Measuring Vacuum Gauges and Their Measurement Ranges
Hydrostatic Manometers
Mechanical and Electromechanical Vacuum Gauges
 
LEAK DETECTION METHODS
Definition of Leakage Rates
Acceptable Leakage Rate of Chemical Plants
Methods of Leak Detection
Helium as a Tracer Gas
Leak Detection of Systems in the Medium-Vacuum Range
Leak Detection on Systems in the Rough Vacuum Range
Leak

Wolfgang Jorisch studied chemistry at RWTH in Aachen, Germany, and received his degree of Dr. rer. nat. for technical chemistry from the University of Essen. From 1987 to 2000 he was a member of the technical chemistry department of the RWTÜV in Essen and manager for chemical applications at Leybold Vacuum in Cologne, Germany. From 2000 to 2005 he was a member of the US/ UK-Graham Vacuum Technology group and since 2005 he holds the position of manager of the German IVPT (Industrielle Vakuumprozeßtechnik) on site of Leybold in Cologne.

He acted as editor of the German version of the book Vacuum Technology for the Chemical Industry and has been managing the VDI-seminar with the same title for several years.