Photometry, Radiometry, and Measurements of Optical Losses / Springer Series in Optical Sciences Bd.209 (PDF)

Michael A Bukshtab received M.S. and Ph.D. degrees in "Optical Design and Spectroscopy" and in "Physical Optics" from The State University of Information Technologies, Mechanics & Optics and from The Vavilov' State Optical Institute, having the post-doctoral tenure analysing high-purity silica glasses and specialty fibres in The Institute of Silicate Chemistry, Academy of Sciences ¿ all in St. Petersburg (Leningrad), Russia. Michael's M.S. thesis received the Best Diploma Award among all Leningrad's technical universities and was published in "Measurement Techniques" in 1978. Michael's monograph "The Low Loss Measurement Techniques", 165 pages, was published in 1988 by Energoatomizdat, Moscow-Leningrad. The second book by M.A. Bukshtab, A. S. Doynikov, and V. N. Koromislichenko, "Photometry and Radiometry for Engineers" (editors M. A. Bukshtab and A. A. Wolkenstein) was left unpublished by Leningrad's Polytechnika. During the Perestroika movement Michael was elected by employees the Board Chairman for the Leningrad Institute of Telecommunications, where he served from 1989 until has immigrating to the United States in 1991. In the USA Michael worked on design, development, fabrication of optical systems and components for various companies, such as Sandoz, Corning, Pirelli, Kodak, CIENA, Lucent, GE Advanced Materials, and ASML. Michael experiences via MBOptical consulting includes designing complex systems and components and investigating various optical properties, while studying colour, polarization-dependent, backreflection, backscattering and other phenomena, developing wavelength-switching or cross-connect systems and OADM networks, working on optical routers and backplanes, investigating lithography and Fourier Transform Infrared Spectroscopy (FTIR) systems, researching augment reality displays, interferometric and diffraction-based positioning sensors, EDFA fibre-laser lidars, improving Brillouin-scattering confocal microscopy and interferometryfor studying